LITHOGRAPHIC MASK LAYOUT DEVELOPING METHOD, LITHOGRAPHIC MASK LAYOUT DEVELOPING APPARATUS, AND COMPUTER-READABLE MEDIUM CONTAINING ONE OR MORE SEQUENCES OF ONE OR MORE COMMANDS FOR EXECUTING METHOD OF DEVELOPING LITHOGRAPHIC MASK LAYOUT

摘要

PPROBLEM TO BE SOLVED: To provide a method and system for producing various patterns for a maskless lithographic system, and more particularly, to provide a technique for maskless lithography to print lines branched at a variety of pitches, and to use mirror arrays of a fixed size for contacting holes. PSOLUTION: This method for developing lithographic maskless layout generates an ideal mask layout, representative of the image characteristics associated with a desired image, and produces an equivalent mirror-based mask layout in accordance with an average intensity of the ideal mask layout. PCOPYRIGHT: (C)2005,JPO&NCIPI