首页> 外国专利> Inspection system and the reflection-type X-ray microscope for inspecting an object at a wavelength ≦ 100nm

Inspection system and the reflection-type X-ray microscope for inspecting an object at a wavelength ≦ 100nm

机译:用于检查波长≤100nm的物体的检查系统和反射型X射线显微镜

摘要

In the reflection-type X-ray microscope for inspecting an object in the object plane, the object, the wavelength 100nm, in particular, it is illuminated by rays of 30nm, and is imaged by enlarging the image plane, the present invention includes a first mirror and a second mirror and, and a first sub-system arranged in the optical path to the image plane from the object plane. The present invention is characterized by including a second secondary system having a first mirror 3 at least reflective X-ray microscope is appended to the first sub system in the optical path.
机译:在用于检查物体平面中的物体的反射型X射线显微镜中,特别是波长<100nm的物体,特别是被<30nm的光线照射,并且通过放大像平面来成像,本发明包括第一反射镜和第二反射镜,以及布置在从物平面到像平面的光路中的第一子系统。本发明的特征在于包括第二次级系统,该第二次级系统具有第一反射镜3,至少反射X射线显微镜在光路上被附加到第一子系统。

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