Performance evaluation method of the plasma processing apparatus, maintenance procedures, performance management system, and performance verification system, and plasma processing apparatus

摘要

PROBLEM TO BE SOLVED: To evaluate simply and promptly whether a requested performance is maintained or not when a plasma treatment device is decomposed and rebuilt after carrying.;SOLUTION: A plurality of plasma treatment chamber units 75, 76, 77, 95, 96, 97 having electrodes 4 and 8, a high-frequency power supply 1 connected to the electrode 4, a matching circuit 2A to gain an impedance alignment with the plasma treatment chamber units 75, 76, 77, 95, 96, 97 and the high-frequency power supply 1, are equipped. Difference |ΔRA||ΔRB| between an input terminal side AC resistance RA and an output terminal side AC resistance RB at a time t0 and a time afterwards t1 is maintained at a smaller value than a given value.;COPYRIGHT: (C)2002,JPO