BODY WITH PATTERN, POSITION MEASURING DEVICE, STAGE DEVICE, EXPOSURE DEVICE AND MANUFACTURING METHOD FOR DEVICE, METHOD FOR MEASURING POSITION, AND EVALUATING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a body or the like with a pattern which allows evaluation of the reproducibility or the like of an alignment sensor without being subject to the effect by the fluctuation of air on the measuring optical path of an interferometer in a VRA type reticle alignment device.;SOLUTION: Third patterns formed by superposing patterns having the same shapes as the pattern for the first body and the pattern for the second body, which are mounted on the first body RST and the second body WST for measuring the relative places of the first body RST and the second body WST movable in two parallel planes respectively, in a specified positional relationship, are fitted to the specified bodies R, W and WFP.;COPYRIGHT: (C)2005,JPO&NCIPI