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Dust-proof fabric for semiconductor clean room, manufacturing method thereof, and dust-proof clothing for semiconductor clean room
Dust-proof fabric for semiconductor clean room, manufacturing method thereof, and dust-proof clothing for semiconductor clean room
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机译:半导体洁净室用防尘布,其制造方法以及半导体洁净室用防尘服
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摘要
A dust-proof fabric is disclosed. The fabric comprises an inner knit fabric layer, an intermediate layer of a moisture absorbent polyurethane film and a high density woven polyester fabric outer layer. The outer layer contains a first set of spaced apart conductive yarns aligned with one another in the warp direction and a second set of spaced apart conductive yarns aligned in the weft direction.
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