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Equipment and gas replacement method, mask protection device, mask, exposure method and apparatus

机译:设备和气体更换方法,面罩保护装置,面罩,曝光方法和装置

摘要

Providing a gas replacement device can be replaced efficiently and stably in the gas space is formed between the protective member which is mounted through the frame member and mask. It is to be understood to replace the specific gas to the first space inside is formed between the mask and the pellicle, the pellicle frame, gas replacement device can supply replacement chamber for the specific gas to the gas exchange chamber I have a gas replacement mechanism. The pellicle frame has a first opening communicating with the outside first space inside the pellicle frame, a space formed for forming a second space on opposite sides of the pellicle to the first space member is connected. By displacement chamber gas replacement mechanism for supplying the specific gas to the gas exchange chamber, a specific gas is supplied to the first space through the first opening.
机译:提供的气体替换装置可以在通过框架部件安装的保护部件与面罩之间形成的气体空间中有效且稳定地进行替换。可以理解的是,将特定的气体置换到在面罩和防护膜之间形成的第一空间内,该防护膜框架,气体置换装置可以将特定的气体的置换室供给到气体交换室。 。防护膜框架具有与防护膜框架内部的外部第一空间连通的第一开口,该防护膜形成为在防护膜的与第一空间部件的相反侧形成第二空间的空间被连接。通过用于向气体交换室供应特定气体的置换室气体替换机构,特定气体通过第一开口被供应至第一空间。

著录项

  • 公开/公告号JPWO2003034475A1

    专利类型

  • 公开/公告日2005-02-03

    原文格式PDF

  • 申请/专利权人 株式会社ニコン;

    申请/专利号JP20030537107

  • 发明设计人 長坂 博之;

    申请日2002-10-10

  • 分类号H01L21/027;G03F1/14;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 22:26:19

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