MASK PROTECTING DEVICE, MASK, GAS REPLACING APPARATUS, EXPOSURE APPARATUS, METHOD FOR REPLACING GAS, AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide a mask protecting device, a mask, a gas replacing apparatus and an exposure apparatus in which the gas in the space formed between the protecting device and the mask substrate can be efficiently and stably replaced.;SOLUTION: The mask protecting device PE comprises a frame member F the one end of which is disposed in the periphery of the pattern forming region PA on the mask substrate P; and a protecting member C disposed on the other end of the frame member F and protecting the pattern forming region PA. The mask protecting device PE is provided with a first through hole h formed in the frame member F to penetrate from the end face of the other end of the frame member F to the inner face of the frame member F.;COPYRIGHT: (C)2004,JPO&NCIPI