Exposure apparatus provided with an optical system, a projection optical system, the projection optical system, and the microdevice manufacturing method using the exposure apparatus

摘要

The present invention, without worsening the imaging performance due to the influence of birefringence is adjusted (for example, the magnification error components, etc. and rotationally asymmetric astigmatism) optical properties rotationally asymmetric with respect to the optical axis of the optical system and an object thereof is to provide an optical system capable of. The optical system according to the present invention, the correction lens is formed by fluorite, formed by fluorite and toric lens having a power rotationally asymmetric pairs, whose crystal axis, the correction lens, crystals toric lens and is arranged to be a predetermined positional relationship with the axis. Also, even when the composed, toric lens is moved and rotated so as to be movable in a direction transverse to the optical axis and is configured to be rotatable about the optical axis, the correction lens and the toric lens, the predetermined positional relationship is maintained.