Methods and apparatuses for heat treatment of semiconductor films upon thermally susceptible non-conducting substrates

摘要

In a method for crystallization or dopant activation heat treatment of a semiconductor film upon a thermally susceptible non-conducting substrate lying onto a susceptor, an induction coil is disposed in close proximity of the semiconductor film and disposed with the electrical current direction of the coil aligned parallel to the in-plane direction of the semiconductor film, a magnetic core is disposed around the coil to strengthen and concentrate a magnetic field generated by the coil onto the semiconductor film, and an alternating electrical current is introduced in the induction coil to generate an alternating magnetic field through the semiconductor film heated by the susceptor to the extent that the semiconductor film can be induction-heated.