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Spin-on adhesive for temporary wafer coating and mounting to support wafer thinning and backside processing

机译:旋涂粘合剂,用于临时晶圆涂覆和安装,以支持晶圆减薄和背面处理

摘要

A liquid form adhesive system is provided for spin-coating on wafers and mounting to rigid carrier substrates to support thinning and backside processing. The liquid adhesive comprises about 30-35% of a rosin, between 5-10% of a thermoplastic urethane, a nonionic surfactant present between 1-3%, and a trace of an ultraviolet fluorescing dye. The entire system is dissolved in 50-65%, by weight, of a dual solvent mixture composed of dimethylacetamide and propylene glycol monomethyl ether. When the mixture is made to a specific viscosity, filtered, applied by a spin-coating method to the wafer frontside surface, and cured, the result is a uniform and smooth surface of defined thickness. When the coated wafer is mounted to a rigid substrate, it may be mechanically thinned to thicknesses down to and beyond 25 um, depending upon the wafer composition, diameter, and process. Once thinned, the adhesive is safe for backside processing and is dissolved away at completion to provide a thinned wafer that is clean and ready for final dicing or chipping operations.
机译:提供了一种液态粘合剂系统,用于在晶圆上旋涂并安装到刚性载体基板上,以支持减薄和背面处理。液体粘合剂包含约30-35%的松香,5-10%的热塑性氨基甲酸酯,1-3%的非离子表面活性剂和痕量的紫外线荧光染料。整个系统溶解在50-65重量%的由二甲基乙酰胺和丙二醇单甲基醚组成的双溶剂混合物中。将混合物调至特定粘度后,进行过滤,通过旋涂法施涂到晶片正面上并进行固化,结果是可以得到厚度均匀且光滑的表面。当将涂覆的晶片安装到刚性基板上时,取决于晶片的组成,直径和工艺,可以将其机械薄化至25μm甚至更低的厚度。一旦变薄,胶粘剂就可以安全地用于背面加工,并在完成后被溶解掉,从而提供了一个薄的晶片,该晶片干净且可以进行最终的切割或切片操作。

著录项

  • 公开/公告号US6869894B2

    专利类型

  • 公开/公告日2005-03-22

    原文格式PDF

  • 申请/专利权人 JOHN C. MOORE;

    申请/专利号US20020325389

  • 发明设计人 JOHN C. MOORE;

    申请日2002-12-20

  • 分类号H01L21/31;H01L21/469;C09J4/00;

  • 国家 US

  • 入库时间 2022-08-21 22:20:30

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