首页>
外国专利>
System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
System and method for improving linewidth control in a lithography device by varying the angular distribution of light in an illuminator as a function of field position
展开▼
机译:通过根据场位置改变照明器中光的角度分布来改善光刻设备中线宽控制的系统和方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Electromagnetic energy is emitted from an illumination source of a lithography device. A portion of the emitted electromagnetic energy passes through an illumination optics module. The illumination optics module includes a one-dimensional optical transform element having a pupil plane. An aperture device having an adjustable aperture is located proximate to the pupil plane so that a portion of the electromagnetic energy received by the one-dimensional optical transform element passes through the aperture of the aperture device. The angular distribution of the electromagnetic energy passing through the illumination optics module is adjusted as a function of illumination field position using the aperture device, thereby improving line width control in the lithography device.
展开▼