首页> 外国专利> ILLUMINATION OPTICAL SYSTEM, PROJECTION/EXPOSURE DEVICE, MICRO DEVICE MANUFACTURING METHOD, ILLUMINATION DEVICE MANUFACTURING METHOD, PROJECTION/EXPOSURE DEVICE ADJUSTMENT METHOD, AND PROJECTION/EXPOSURE DEVICE MANUFACTURING METHOD

ILLUMINATION OPTICAL SYSTEM, PROJECTION/EXPOSURE DEVICE, MICRO DEVICE MANUFACTURING METHOD, ILLUMINATION DEVICE MANUFACTURING METHOD, PROJECTION/EXPOSURE DEVICE ADJUSTMENT METHOD, AND PROJECTION/EXPOSURE DEVICE MANUFACTURING METHOD

机译:照明光学系统,投影/曝光设备,微设备制造方法,照明设备制造方法,投影/曝光设备调整方法,以及投影/曝光设备制造方法

摘要

It is possible to reduce the slightest illumination irregularities generated after assembling an optical system. For this, an illumination optical system includes a light source (11) emitting extreme ultra-violet light, a collimator (12), a Fly’s eye mirror (13), and a capacitor (14) which are successively arranged. A predetermined illumination area in the emission side of the capacitor (14) is subjected to Köhler illumination. At least one of the unit mirrors constituting the Fly’s eye mirror (13) is a correction mirror having reflectivity irregularities for correcting a part or all of the illumination irregularities in the aforementioned illumination area.
机译:可以减少组装光学系统后产生的最轻微的照明不规则。为此,照明光学系统包括依次发出的发出极端紫外线的光源(11),准直仪(12),蝇眼镜(13)和电容器(14)。对电容器(14)的发射侧的预定照明区域进行科勒照明。构成蝇眼镜(13)的单位镜中的至少一个是具有用于校正上述照明区域中的一部分或全部的照明不均的反射率不均的校正镜。

著录项

  • 公开/公告号WO2004100236A1

    专利类型

  • 公开/公告日2004-11-18

    原文格式PDF

  • 申请/专利权人 NIKON CORPORATION;SUZUKI KENJI;

    申请/专利号WO2004JP06416

  • 发明设计人 SUZUKI KENJI;

    申请日2004-05-06

  • 分类号H01L21/027;G03F7/20;G21K1/06;G21K5/02;G02B5/08;

  • 国家 WO

  • 入库时间 2022-08-21 22:12:27

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