Illumination optical system, projection/exposure device, micro device manufacturing method, illumination device manufacturing method, projection/exposure device adjustment method, and projection/exposure device manufacturing method

摘要

An object of this invention is to reduce even slight irregularities in illumination that occur after assembly of an optical system. To this end, in an exemplary illumination-optical system, a light source that emits extreme ultraviolet (EUV) light, a collimator, a fly's-eye mirror, and a condenser are positioned, in this stated order. A prescribed illumination area on the emission side of the condenser is irradiated with Köhler illumination. At least one unit mirror, among multiple unit mirrors of the fly's-eye mirror, is a correction mirror that has reflectivity irregularities. The reflectivity irregularities correct a portion of, or all, the illumination irregularities in the illumination area.