PROJECTION BEAM SYSTEM FOR MASKLESS LITHOGRAPHY COMPRISING LIGHTING SYSTEM, SPATIAL LIGHT MODULATOR, EXPOSURE SYSTEM AND BEAM SPLITTER, AND SPACE LIGHT MODULATOR

摘要

PURPOSE: Provided are a projection beam system for maskless lithography provided with a spatial light modulator whose diameter is not limited by the size of an optical device, and a spatial light modulator. CONSTITUTION: The projection beam system(200) for maskless lithography comprises a lighting system(202); a spatial light modulator(204) having a nonlinear shape; an exposure system; and a beam splitter(206) which guides light from the exposure system to the spatial light modulator and from the spatial light modulator to the exposure system. Preferably the spatial light modulator has a concave, convex or spherical shape. Also the projection beam system for maskless lithography comprises a lighting means for generating light; a means for guiding the light; a means which has a nonlinear patterning surface and accommodates the light from the guide means to form a pattern; and a means which exposes the patterned light on a target(210).