APPARATUS AND METHOD OF TREATING EDGE OF SEMICONDUCTOR SUBSTRATE FOR PREVENTING BRIDGE BETWEEN TRANSISTORS BY REMOVING RESIDUAL PARTICLES FROM EDGE OF SEMICONDUCTOR SUBSTRATE

摘要

PURPOSE: An apparatus and a method of treating an edge of a semiconductor substrate are provided to prevent a bridge between transistors by removing residual particles from the edge of the semiconductor substrate. CONSTITUTION: A semiconductor substrate is loaded on a supporting part. A protection cover(200) is used for preventing the inflow of fluid into a protection side of the semiconductor substrate. The protection cover moves up and down. A chemical supply nozzle is used for supplying a first chemical to an edge of the semiconductor substrate. A cleaning unit(500) cleans the edge of the semiconductor substrate.