PLASMA SOURCE OF THREE-DIMENSIONAL STRUCTURE AND PLASMA CHAMBER USING THE SAME TO EASILY CONTROL PROCESS CHARACTERISTIC

摘要

PURPOSE: A plasma source of a three-dimensional structure is provided to easily control a process characteristic by generating a high plasma density while generating a uniform distribution of plasma. CONSTITUTION: A plasma source receives power from a power source and generates plasma in a predetermined reaction space. A bushing pillar is vertically planted, including the first surface in its lower part and the second surface in its upper part. At least two unit coils(310,320,330) are ramified from the bushing pillar on the same horizontal surface as the second surface of the bushing pillar and is disposed as a circulated spiral type in the circumference of the second surface of the bushing pillar. The unit coils maintain a predetermined radius in a vertical direction in a position reaching the predetermined radius, extended to the same horizontal surface as the first surface.