首页> 外国专利> METHOD FOR MANUFACTURING SUBSTRATE HAVING ATTACHED RESIST FILM, PARTICULARLY REGARDING TO IMPROVING UNIFORMITY OF THICKNESS OF RESIST FILM

METHOD FOR MANUFACTURING SUBSTRATE HAVING ATTACHED RESIST FILM, PARTICULARLY REGARDING TO IMPROVING UNIFORMITY OF THICKNESS OF RESIST FILM

机译:具有附着的抗蚀膜的基材的制造方法,特别是与提高抗蚀膜的厚度的均匀性有关的方法

摘要

PURPOSE: A method for manufacturing a substrate having an attached resist film is provided to improve uniformity of thickness of the resist film by forming an applied film having small film thickness distribution. CONSTITUTION: A resist agent(21) is contacted to a surface(10a) to be applied, through an upper end of an applying nozzle(22). A gap(G) between the applying nozzle and the surface to be applied is 50% or more of a separation solution gap within a range of the separation solution gap separating the resist agent from the surface to be applied.
机译:目的:提供一种用于制造具有附着的抗蚀剂膜的基板的方法,以通过形成具有小的膜厚度分布的施加膜来提高抗蚀剂膜的厚度的均匀性。组成:抗蚀剂(21)通过涂敷喷嘴(22)的上端与要涂敷的表面(10a)接触。涂布喷嘴与被涂布面之间的间隙(G)在将抗蚀剂与被涂布面分离的分离液间隙的范围内为分离液间隙的50%以上。

著录项

  • 公开/公告号KR20050009241A

    专利类型

  • 公开/公告日2005-01-24

    原文格式PDF

  • 申请/专利权人 HOYA CORPORATION;

    申请/专利号KR20040055669

  • 发明设计人 MOTOMURA SHUHOU;

    申请日2004-07-16

  • 分类号G02F1/13;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:59

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