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METHOD FOR MANUFACTURING SUBSTRATE HAVING ATTACHED RESIST FILM, PARTICULARLY REGARDING TO IMPROVING UNIFORMITY OF THICKNESS OF RESIST FILM
METHOD FOR MANUFACTURING SUBSTRATE HAVING ATTACHED RESIST FILM, PARTICULARLY REGARDING TO IMPROVING UNIFORMITY OF THICKNESS OF RESIST FILM
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机译:具有附着的抗蚀膜的基材的制造方法,特别是与提高抗蚀膜的厚度的均匀性有关的方法
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摘要
PURPOSE: A method for manufacturing a substrate having an attached resist film is provided to improve uniformity of thickness of the resist film by forming an applied film having small film thickness distribution. CONSTITUTION: A resist agent(21) is contacted to a surface(10a) to be applied, through an upper end of an applying nozzle(22). A gap(G) between the applying nozzle and the surface to be applied is 50% or more of a separation solution gap within a range of the separation solution gap separating the resist agent from the surface to be applied.
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