首页> 外国专利> LIGHT EMITTING DIODE HAVING VERTICAL ELECTRODE STRUCTURE, METHOD FOR MANUFACTURING THE SAME AND ETCHING METHOD FOR SAPPHIRE SUBSTRATE TO INCREASE CHIP PRODUCTION PER WAFER

LIGHT EMITTING DIODE HAVING VERTICAL ELECTRODE STRUCTURE, METHOD FOR MANUFACTURING THE SAME AND ETCHING METHOD FOR SAPPHIRE SUBSTRATE TO INCREASE CHIP PRODUCTION PER WAFER

机译:具有垂直电极结构的发光二极管,制造方法相同的方法和蓝宝石基质的蚀刻方法以增加晶片的芯片产量

摘要

PURPOSE: A light emitting diode having a vertical electrode structure, a manufacturing method for the same are provided for simplifying a manufacturing process. CONSTITUTION: A basic substrate(17) is provided with a via. A first conductive contact layer(15) is formed on the basic substrate. A first conductive clad layer(143) is formed on the first conductive contact layer. A light emitting layer(142) is formed on the first conductive clad layer. A second conductive clad layer(141) is formed on the light emitting layer. A second conductive contact layer(13) is formed on the second conductive clad layer. A first electrode(12) is formed on the second conductive contact layer. A second electrode(19) is connected with the first conductive contact layer through the via.
机译:目的:提供一种具有垂直电极结构的发光二极管及其制造方法,以简化制造工艺。组成:基本基板(17)设有通孔。在基础基板上形成第一导电接触层(15)。在第一导电接触层上形成第一导电覆盖层(143)。在第一导电覆层上形成发光层(142)。在发光层上形成第二导电覆层(141)。在第二导电覆盖层上形成第二导电接触层(13)。在第二导电接触层上形成第一电极(12)。第二电极(19)通过通孔与第一导电接触层连接。

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