MASK FOR DEPOSITION, CAPABLE OF SUPPRESSING DEPOSITION OF DEPOSITION MATERIAL DURING FORMATION OF DEPOSITION LAYER, FILM FORMATION METHOD USING THE SAME, AND FILM FORMATION APPARATUS USING THE SAME

摘要

PURPOSE: A mask, a film formation method, and a film formation apparatus are provided to suppress deposition of a deposition material on the mask during formation of a deposition layer on a substrate using the mask, and achieve improved accuracy of size of the deposition layer on the substrate. CONSTITUTION: A mask(22) comprises a mask body(22a) having an opening(23); and a heating portion(22d) heated during deposition and arranged on one side of the mask body facing a deposition source(17). The heating portion has an opening substantially corresponding to the opening of the mask body. The heating portion is heated by the heat generated from the deposition source and a deposition material.