METHOD FOR FABRICATING WIRE GRID POLARIZER, ESPECIALLY DEPOSITING PHOTORESIST ON BUFFER LAYER USING HMDS(HEXAMETHYLDISILAZANE)

摘要

PURPOSE: A method for fabricating a wire grid polarizer is provided to produce the wire grid polarizer easily which has a fine period using a laser interference lithography, a side wall patterning technology, and an aluminum etching technology. CONSTITUTION: According to the method, a metallic thin film(210a) and an insulation layer, a buffer layer, and a photoresist are formed on a substrate(200) in sequence. A pattern(240) of a fixed period is formed with the photoresist. A buffer layer pattern is formed by etching the photoresist pattern with a mask. An insulation layer pattern is formed by etching the photoresist and the buffer layer pattern with a mask. The photoresist and the buffer layer pattern are removed. SiN(250a) is deposited on the insulation layer pattern. A SiN pattern(250b) is formed on an insulation layer pattern side wall by etching the SiN. A metallic thin film pattern is formed by removing the insulation layer pattern and etching the SiN pattern with a mask. Then the SiN pattern is removed.