首页> 外国专利> METHOD FOR PURIFYING NITROGEN TRIFLUORIDE GAS BY TREATING RAW NITROGEN TRIFLUORIDE(NF3) GAS CONTAINING OXIDATIVE IMPURITIES USING AQUEOUS REDUCING AGENT SOLUTION HAVING pH RANGE OF 8 TO 12

METHOD FOR PURIFYING NITROGEN TRIFLUORIDE GAS BY TREATING RAW NITROGEN TRIFLUORIDE(NF3) GAS CONTAINING OXIDATIVE IMPURITIES USING AQUEOUS REDUCING AGENT SOLUTION HAVING pH RANGE OF 8 TO 12

机译:通过使用pH值为8至12的还原剂水溶液处理含有氧化性杂质的原始三氟化氮(NF3)气体来纯化三氟化氮气体的方法

摘要

PURPOSE: To economically prepare high purity nitrogen trifluoride in which oxidative impurities such as OF2 and F2 exist in extremely small quantities, and which does not contain CO2, NO and NO2 at all by treating nitrogen trifluoride with an aqueous reducing agent solution in a pH range of 8 to 12, thereby effectively removing oxidative impurities. CONSTITUTION: A purification method of nitrogen trifluoride(NF3) gas is characterized in that nitrogen trifluoride gas containing oxidative impurities is treated with an aqueous reducing agent solution in a pH range of 8 to 12, wherein the aqueous reducing agent solution is an aqueous solution containing 0.1 to 20 wt.% of a reducing agent elected from Na2S2O3, Na2SO3, HI, K2S2O3, K2SO3 and a mixture thereof, wherein purified nitrogen trifluoride contains 0.05 ppm or less of oxidative impurities, wherein the oxidative impurities are OF2, F2, CO2, NO, NO2 or a mixture thereof, and wherein nitrogen trifluoride containing oxidative impurities is derived from a process of reacting the prepared fluorine with ammonia or ammonium salts such as ammonium fluorides after preparing fluorine(F2) by electrolyzing hydrofluoric acid(HF) or a process of directly electrolyzing fluorides of ammonia(NH3).
机译:目的:经济地制备高纯度的三氟化氮,方法是在pH范围内用还原剂水溶液处理三氟化氮,其中氧化杂质如OF2和F2的含量极少,并且根本不含CO2,NO和NO2。 8至12的浓度,从而有效去除氧化性杂质。组成:一种三氟化氮(NF3)气体的净化方法,其特征在于,将含有氧化性杂质的三氟化氮气体用pH值为8至12的还原剂水溶液处理,其中还原剂水溶液为含有0.1-20 wt%的还原剂,选自Na2S2O3,Na2SO3,HI,K2S2O3,K2SO3及其混合物,其中纯化的三氟化氮含有0.05 ppm或更少的氧化杂质,其中氧化杂质为OF2,F2,CO2, NO,NO 2或它们的混合物,并且其中含有氧化杂质的三氟化氮是通过电解氢氟酸(HF)制备氟(F2)后,使制得的氟与氨或铵盐(如氟化铵)反应的方法或一种方法制得的直接电解氨(NH3)的氟化物的方法

著录项

  • 公开/公告号KR20050023949A

    专利类型

  • 公开/公告日2005-03-10

    原文格式PDF

  • 申请/专利权人 SODIFF CO. LTD.;

    申请/专利号KR20030061727

  • 发明设计人 CHUN KYUNG WOO;

    申请日2003-09-04

  • 分类号C01B21/083;

  • 国家 KR

  • 入库时间 2022-08-21 22:05:42

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