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SOC INCLUDING DRAM ANALOG DEVICE FOR IMPROVING DRAM CAPACITANCE AND FABRICATING METHOD THEREOF FOR INCREASING CAPACITANCE OF CAPACITOR USED AS UNIT CELL OF DRAM
SOC INCLUDING DRAM ANALOG DEVICE FOR IMPROVING DRAM CAPACITANCE AND FABRICATING METHOD THEREOF FOR INCREASING CAPACITANCE OF CAPACITOR USED AS UNIT CELL OF DRAM
PURPOSE: An SOC(System On Chip) including a DRAM analog device for improving a DRAM capacitance and a fabricating method thereof are provided to increase a capacitance of a capacitor per unit surface area by maximizing each surface area of a top electrode and a bottom electrode. CONSTITUTION: A lower structure(102) includes a DRAM and an analog component formed on a semiconductor substrate. A first interlayer dielectric(104) is formed on the lower structure. A first conductive layer(106) is formed on the first interlayer dielectric. A first insulating layer is formed on the first conductive layer. A second conductive layer pattern is formed on the first insulating layer. A third conductive layer(114) is formed to fill the second conductive layer pattern. A second interlayer dielectric(120) is formed to control a step of the semiconductor substrate. A top electrode metal pattern(126) is formed on the second interlayer dielectric. A bottom electrode metal pattern(124) is formed on the second interlayer dielectric.
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