A laser beam irradiation apparatus according to an embodiment of the present invention is a laser beam irradiation apparatus for irradiating a laser beam by oscillating a frequency in a thin film of amorphous silicon formed on an insulating substrate, a laser oscillating a laser beam constantly generating a laser beam while performing a transmission lens, the polycrystalline process for deriving the integration of a thin film was irradiated with ultraviolet rays on a thin film includes a UV irradiation unit for performing the annealing.
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