首页> 中文期刊> 《武汉理工大学学报:材料科学英文版》 >Crystallization and Electrical Properties of (Ba_(0.4)Pb_(0.3))Sr_(0.3)TiO_3 Thin Film by Pulsed Laser Deposition

Crystallization and Electrical Properties of (Ba_(0.4)Pb_(0.3))Sr_(0.3)TiO_3 Thin Film by Pulsed Laser Deposition

         

摘要

(Ba_(0.4)Pb_(0.3))Sr_(0.3)TiO_3 thin films were fabricated via pulsed laser deposition(PLD)technique on Pt/TiO_2/SiO_2/Si substrate.The crystallization of the films was characterized by XRD and FSEM,and the experimental results suggested deposition parameters,especially the deposition temperature was the key factor in forming the perovskite structure.The dielectric properties of the film deposited with optimized parameters were studied by an Agilent 4294A impedance analyzer at 1 MHz.The dielectric constant was 772,and the loss tangent was 0.006.In addition,the well-shaped hysteresis loop also showed that the film had a well performance in ferroelectric.The saturated polarization P,remnant polarization Pr and coercive field E were about 4.6μC/cm^2,2.5μC/cm^2 and 23 kV/cm(the coercive voltage is 0.7 V),respectively.It is suggested the film should be a promising candidate for microwave applications and nonvolatile ferroelectric random access memories (NvFeRAMs).

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