首页> 外国专利> FABRICATION APPARATUS OF MICRO-STRUCTURE FOR REMOVING TRANSIENT AREA OF INCLINED X-RAY EXPOSURE AND FABRICATION METHOD THEREOF

FABRICATION APPARATUS OF MICRO-STRUCTURE FOR REMOVING TRANSIENT AREA OF INCLINED X-RAY EXPOSURE AND FABRICATION METHOD THEREOF

机译:去除倾斜的X射线过渡区的微结构制造装置及其制造方法

摘要

The present invention using a LIGA process discloses a device and a method for forming an inclined surface in the fine structure consisting of the photosensitive polymer. The present invention in further detail will eliminate the exposure light source of X-rays for the transition region of the can to remove a portion having a non-uniform intensity X-ray gradient exposure with a fine structure by forming an inclined surface in the fine structure by vertically exposed to X-ray mask It discloses an apparatus and a method for.
机译:使用LIGA工艺的本发明公开了一种用于在由光敏聚合物组成的精细结构中形成倾斜表面的装置和方法。更详细地,本发明将消除用于罐的过渡区域的X射线的曝光光源,以通过在细小表面上形成倾斜表面来去除具有细微结构的强度X射线梯度曝光不均匀的部分。通过垂直地暴露于X射线掩模而形成的结构公开了一种装置和方法。

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