FABRICATION APPARATUS OF MICRO-STRUCTURE FOR REMOVING TRANSIENT AREA OF INCLINED X-RAY EXPOSURE AND FABRICATION METHOD THEREOF

摘要

This invention is a device for forming an inclined surface in the fine structure consisting of the photosensitive polymer using a LIGA process and discloses the method. More specifically the present invention is to remove the transition region of the X-ray exposure gradient to remove a portion having a non-uniform illumination of the microstructure by forming the inclined surface microstructures by exposing the exposure light source perpendicular to the X-ray to the X-ray mask discloses an apparatus and a method for .