首页> 外国专利> THICK FILM PHOTORESIST LAYER LAMINATE, METHOD OF MANUFACTURING THICK FILM RESIST PATTERN, AND METHOD OF MANUFACTURING CONNECTING TERMINAL

THICK FILM PHOTORESIST LAYER LAMINATE, METHOD OF MANUFACTURING THICK FILM RESIST PATTERN, AND METHOD OF MANUFACTURING CONNECTING TERMINAL

机译:厚膜光刻胶层合板,厚膜光刻胶图案的制造方法以及连接端子的制造方法

摘要

In the thick film photoresist layer used in the production of the connection terminal or the like, the resist composition reacts with high sensitivity, there is provided a means to form a resist pattern with high precision. (A) a support and, (b) the thick film photoresist layer to an alkali-soluble contains a resin and an acid generator which is changed by the action of an acid, the (a) contact of the substrate and the (b) the thick film photoresist layer using the interference (c) a thick film photoresist layer laminate that is laminated with a shield layer to form a resist pattern, and using this to form a connection terminal.
机译:在用于制造连接端子等的厚膜光致抗蚀剂层中,抗蚀剂组合物以高灵敏度反应,提供了一种形成高精度抗蚀剂图案的手段。 (A)支撑体,以及(b)碱溶性厚膜光刻胶层包含树脂和产酸剂,该产酸剂通过酸,(a)基板与(b)的接触而发生变化(c)将厚膜光致抗蚀剂层积体与屏蔽层层叠而形成抗蚀剂图案,并使用该干涉膜形成连接端子,由此形成厚膜光致抗蚀剂层。

著录项

  • 公开/公告号KR100494865B1

    专利类型

  • 公开/公告日2005-06-14

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20020065887

  • 申请日2002-10-28

  • 分类号G03F7/09;

  • 国家 KR

  • 入库时间 2022-08-21 22:03:43

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