Methods for Preparing Alkaline Solution, Alkaline Solution Prepared Thereby, Methods for Forming Pattern, Methods for Stripping Resist Film, Apparatus for Applying Liquid Chemical, Methods for Treating Substrate, and Methods for Supplying Liquid Chemical

摘要

The present invention suppress the defect generated at the time of developing the resist film or size difference occurs in the pattern roughness (疎 密).; The present invention also relates to the gas molecules having oxidation resistance from the developing solution supply nozzle 111 on the substrate 100, a photosensitive resist film having completed the exposure of the surface of supplying the molten developer is characterized in that for developing the photosensitive resist film.