Novel Onium Salts, Photoacid Generator, Resist Compositions, and Patterning Process

摘要

The present invention relates to an onium salt represented by the following general formula (1).;; Wherein; R ¹ represents a substituted or unsubstituted aryl group having 6 to 14,; R ² are the same or be different, and represent a hydrogen atom or a straight chain, branched substituted or unsubstituted alkyl group or cyclic group of 1 to 6 carbon atoms,; R ⁰ represents a hydroxyl group, an alkoxy group, a halogen atom or a nitro,; p, q, r are each 1 or 2;; R ³ are the same or can be different and represents a substituted or unsubstituted aryl group having 1 to 10 carbon linear, branched substituted or unsubstituted alkyl group or cyclic, or C 6 -C 14,; M represents a sulfur atom or an iodine atom, M is a sulfur atom when A is a 3, and a is 2 when M is iodine.