Imaging system for a, to extreme ultraviolet (euv) radiation cell-based microscope

摘要

The present invention relates to a reflective imaging system for an x-ray microscope for the investigation of an object in an object plane, wherein said object with radiation of a wavelength of less than 100 nm, in particular 30 nm, is illuminated and in an image plane is imaged on an enlarged scale.In the case of the imaging system according to the invention for a, to extreme ultraviolet (euv) radiation microscope with wavelengths in the range of less than 100 nm, with a magnification of 0,1 - 1000 x and a length of & 5 m, has at least one of the in the beam path existing imaging optical elements, a diffractive - reflective structure, which on a spherical or a planar base surface and is applied by means of a not rotationally symmetrical, asymmetrical shape.The arrangement according to the invention provides an imaging system is made available, which in the prior art which avoids the disadvantages known and a high image quality is ensured. The production expenditure remains of the exclusive use of spherical mirrors be economically justified.