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Imaging system for microscope based on extreme ultraviolet (EUV) radiation

机译:基于极紫外辐射的显微镜成像系统

摘要

The microscope operates with wavelength of less than 100 nm, especially less than 30 nm i.e. EUV (Extreme Ultraviolet) or X-rays. The microscope may be operated with a magnification of 0.1 to 1000x. The microscope is contained inside a vacuum chamber to avoid absorption of transmitted light. Light from the object (1) is reflected off a first mirror (2) which may be slightly concave, aspherical and may have a reflective diffraction grating of approximately 240 lines/mm. Light is then reflected off a second mirror (3) which may be spherical convex with a diffractive structure of approximately 660 lines/mm. The distance between the object and the intermediate focus point (4) is less than 5 m.
机译:显微镜的工作波长小于100 nm,特别是小于30 nm,即EUV(极紫外)或X射线。显微镜可以在0.1到1000x的放大倍数下操作。显微镜装在真空室内,以避免吸收透射光。来自物体(1)的光被第一反射镜(2)反射,该第一反射镜可以是稍微凹入的,非球面的并且可以具有大约240线/ mm的反射衍射光栅。然后,光从第二反射镜(3)反射,该第二反射镜可以是球形凸面,具有大约660线/ mm的衍射结构。物体和中间焦点(4)之间的距离小于5 m。

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