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Imaging system for microscope based on extreme ultraviolet (EUV) radiation
Imaging system for microscope based on extreme ultraviolet (EUV) radiation
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机译:基于极紫外辐射的显微镜成像系统
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摘要
The microscope operates with wavelength of less than 100 nm, especially less than 30 nm i.e. EUV (Extreme Ultraviolet) or X-rays. The microscope may be operated with a magnification of 0.1 to 1000x. The microscope is contained inside a vacuum chamber to avoid absorption of transmitted light. Light from the object (1) is reflected off a first mirror (2) which may be slightly concave, aspherical and may have a reflective diffraction grating of approximately 240 lines/mm. Light is then reflected off a second mirror (3) which may be spherical convex with a diffractive structure of approximately 660 lines/mm. The distance between the object and the intermediate focus point (4) is less than 5 m.
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