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Mask unit for optical system, especially for device for wave front measurement of microlithographic projection lens, comprises mask structure layer on support which is heat-conducting in region next to mask structure layer
Mask unit for optical system, especially for device for wave front measurement of microlithographic projection lens, comprises mask structure layer on support which is heat-conducting in region next to mask structure layer
A mask unit comprises a mask structure layer (2a) on a support (4a) which is heat-conducting in a region lying next to the mask structure layer. A tempering unit (6a, 8a) is assigned to the support.
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