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Adjustment marking for alignment of semiconductor wafer in photolithographic structuring apparatus using grid structure and partial structure each having evenly spaced parallel structural elements
Adjustment marking for alignment of semiconductor wafer in photolithographic structuring apparatus using grid structure and partial structure each having evenly spaced parallel structural elements
The adjustment marking has a grid structure (10), for provision of a diffraction grating in the photolithographic structuring apparatus, formed by a number of first structural elements (12) applied to the surface of the semiconductor wafer in parallel with one another, at a defined relative spacing, selected elements interrupted for providing a region (14) without any structural elements. At least one partial structure (16), providing a diffraction grating and a reflection pattern in the photolithographic structuring apparatus, has a number of second structural elements (18), at least some of which extend in line with first structural elements of the grid structure.
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