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Method and system for controlling the chemically - mechanical polishing, with the use of a sensor signal of a cushion position ierers conditioned

机译:用于控制化学-机械抛光的方法和系统,该方法和系统使用缓冲垫位置变化的传感器信号

摘要

In a system and method according to the present invention, a sensor signal, for example a motor current signal, of a drive arrangement of a pad conditioning system, are used in order to control a cmp - system, so that a change in the state of consumable materials to be compensated for, as a result of which the process stability is improved.
机译:在根据本发明的系统和方法中,使用垫调节系统的驱动装置的传感器信号,例如电动机电流信号,以控制CMP系统,从而状态改变可以补偿的消耗材料的数量,从而提高了工艺稳定性。

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