首页>
外国专利>
Method and system for controlling the chemically - mechanical polishing, with the use of a sensor signal of a cushion position ierers conditioned
Method and system for controlling the chemically - mechanical polishing, with the use of a sensor signal of a cushion position ierers conditioned
展开▼
机译:用于控制化学-机械抛光的方法和系统,该方法和系统使用缓冲垫位置变化的传感器信号
展开▼
页面导航
摘要
著录项
相似文献
摘要
In a system and method according to the present invention, a sensor signal, for example a motor current signal, of a drive arrangement of a pad conditioning system, are used in order to control a cmp - system, so that a change in the state of consumable materials to be compensated for, as a result of which the process stability is improved.
展开▼