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Probe station for measuring silicon wafers characteristic, has tub enclosure supporting conductive portion that include openings through which probes are placed, and conductive plates placed over unused openings
Probe station for measuring silicon wafers characteristic, has tub enclosure supporting conductive portion that include openings through which probes are placed, and conductive plates placed over unused openings
The station has a plate assembly with a conductive portion (240) having openings (242), where the conductive portion is supported by a tub enclosure (120). Probes are placed through the openings. Conductive plates are placed over unused openings. The enclosures lower portion is opened to permit a chuck to be lowered and raised with respect to the enclosure to load a wafer.
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