首页> 外国专利> Probe station for measuring silicon wafers characteristic, has tub enclosure supporting conductive portion that include openings through which probes are placed, and conductive plates placed over unused openings

Probe station for measuring silicon wafers characteristic, has tub enclosure supporting conductive portion that include openings through which probes are placed, and conductive plates placed over unused openings

机译:用于测量硅晶片特性的探针台,具有支撑导电部分的桶式外壳,该导电部分包括通过其放置探针的开口,以及在未使用的开口上方放置的导电板

摘要

The station has a plate assembly with a conductive portion (240) having openings (242), where the conductive portion is supported by a tub enclosure (120). Probes are placed through the openings. Conductive plates are placed over unused openings. The enclosures lower portion is opened to permit a chuck to be lowered and raised with respect to the enclosure to load a wafer.
机译:该工位具有板组件,该板组件具有带有开口(242)的导电部分(240),其中导电部分由盛水桶外壳(120)支撑。探针穿过开口放置。导电板放在未使用的开口上。打开外壳的下部以允许卡盘相对于外壳下降和升高以装载晶片。

著录项

  • 公开/公告号DE20321021U1

    专利类型

  • 公开/公告日2005-09-15

    原文格式PDF

  • 申请/专利权人 CASCADE MICROTECH INC.;

    申请/专利号DE2003221021U

  • 发明设计人

    申请日2003-10-27

  • 分类号G01R31/28;G01R31/26;H01L21/66;

  • 国家 DE

  • 入库时间 2022-08-21 22:00:06

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