Method for the dosing of elements from a substrate for optical, electronic or opto-electronic applications

摘要

The invention concerns a method for measuring at least an element in a material (2) containing silicon, comprising the following steps: decomposing at least part of the material (2) with an etchant (6) to form a solution containing hexafluorosilicic acid (7) and the elements to be measured; heating said solution up to a temperature such that at least a substantial part of the hexafluorosilicic acid (7) is transformed into silicon tetrafluoride and a substantial part of the silicon tetrafluoride is evaporated, to obtain a measuring solution wherein the silicon content is substantially reduced while preserving the amount of each element to be measured; and measuring at least one element contained in the measuring solution. The invention is applicable in the field of manufacture of substrates or components for optics, electronics or optoelectronics, in particular for quality control.