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LASER TREATMENT SYSTEM, LASER SYSTEM, EXPOSING SYSTEM, EXPOSING METHOD, AND DEVICE MANUFACTURING METHOD

机译:激光处理系统,激光系统,曝光系统,曝光方法和设备制造方法

摘要

PROBLEM TO BE SOLVED: To prevent the working efficiency of a treatment equipment from reducing when any laser apparatus stops without being involved in an increase in cost because of the increasing of the number of the laser equipments.;SOLUTION: The laser apparatuses 15a to 15c are located with the same number of the exposing apparatuses 12a to 12c. When any laser apparatus (e.g. laser apparatus 15a) stops due to failure or maintenance etc., an exposure controller 11 synchronizes with the working state of the exposing apparatus 12a to 12c to control driving mirrors 16a to 16c of a distributor 14, and the laser beams from the other laser apparatuses 15b, 15c are supplied to the stopped exposing apparatus 12a corresponding to the suspended laser apparatus 15a. The exposure controller 11 performs the above control, for example, when the exposing apparatus 12b does not need a supply of a laser beam for a time because of lot exchange etc.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:为了防止当任何激光设备停止时治疗设备的工作效率降低而不会由于增加激光设备的数量而增加成本。;解决方案:激光设备15a至15c曝光装置12a至12c位于相同数量。当任何激光装置(例如激光装置15a)由于故障或维护等原因而停止时,曝光控制器11与曝光装置12a至12c的工作状态同步以控制分配器14的驱动镜16a至16c。来自其他激光装置15b,15c的光束被提供给与悬挂的激光装置15a相对应的停止曝光装置12a。曝光控制部11例如在由于批量交换等而使曝光装置12b暂时不需要激光的供给的情况下,进行上述控制。COPYRIGHT:(C)2007,JPO&INPIT

著录项

  • 公开/公告号JP2006278961A

    专利类型

  • 公开/公告日2006-10-12

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20050099441

  • 发明设计人 OKITA SHINICHI;SUZUKI HIROYUKI;

    申请日2005-03-30

  • 分类号H01L21/027;G03F7/20;H01S3/00;

  • 国家 JP

  • 入库时间 2022-08-21 21:57:14

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