首页> 外国专利> METHOD FOR FORMING OBJECT TO BE PLATED, METHOD FOR FORMING ELECTROPLATING FILM, OBJECT TO BE PLATED AND ELECTROPLATING FILM

METHOD FOR FORMING OBJECT TO BE PLATED, METHOD FOR FORMING ELECTROPLATING FILM, OBJECT TO BE PLATED AND ELECTROPLATING FILM

机译:形成对象的方法,电镀膜的形成方法,对象和电镀膜的方法

摘要

PROBLEM TO BE SOLVED: To provide a method for forming the object to be plated in which parts on which metal is not deposited are partially present in electroless plating, to provide a method for forming an electroplating film utilizing the same, to provide the object to be plated, and to provide an electroplating film.;SOLUTION: A synthetic resin in a liquid state is mixed with a curing agent of curing the synthetic resin and a water-soluble substance dissolved in water, and the mixture is molded and solidified, so as to form a base material. Then, at least a partial region in the face to be plated to be subjected to plating treatment in the base material is polished, and the water-soluble substance occluded in the synthetic resin is exposed to the face to be plated in the base material. The base material is dipped into an electroless plating liquid, and, as the water-soluble substance exposed to the face to be plated is dissolved in the electroless plating liquid, an electroless plating film is formed on the region other than the part corresponding to the water-soluble substance exposed to the face to be plated. Further, the electroless plating film is subjected to electroplating treatment, thus an electroplating film having vacancies is formed.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种形成待镀覆对象的方法,其中在化学镀中部分存在未沉积金属的部分,提供一种利用该镀覆对象形成电镀膜的方法,以提供一种镀覆对象。解决方案:将液态合成树脂与固化合成树脂和溶于水的水溶性物质的固化剂混合,然后将其成型并固化,作为基础材料。然后,对基材中的要进行镀敷处理的镀敷面的至少一部分区域进行研磨,将合成树脂中所含的水溶性物质暴露于基材中的要镀敷的面。将基材浸入化学镀液中,并且随着暴露于待镀面的水溶性物质溶解在化学镀液中,在与镀层相对应的部分以外的区域上形成化学镀膜。水溶性物质暴露在待镀面上。此外,对化学镀膜进行电镀处理,从而形成具有空位的电镀膜。版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006117992A

    专利类型

  • 公开/公告日2006-05-11

    原文格式PDF

  • 申请/专利权人 DAIKO SANGYO KK;

    申请/专利号JP20040306757

  • 发明设计人 OIWA HIROKAZU;

    申请日2004-10-21

  • 分类号C23C18/20;C25D1/08;C25D1/10;

  • 国家 JP

  • 入库时间 2022-08-21 21:56:42

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号