MATERIAL FOR PARTS IN VACUUM APPARATUS, PARTS IN VACUUM APPARATUS, VACUUM APPARATUS, METHOD FOR MANUFACTURING MATERIAL FOR PARTS IN VACUUM APPARATUS, METHOD FOR TREATING PARTS IN VACUUM APPARATUS, AND TREATMENT METHOD IN VACUUM APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a material for parts in a vacuum apparatus, which reduces the gas-releasing rate from the parts to a value lower than 10^-12 Pa (H₂) m/s.;SOLUTION: The method for manufacturing the material for the parts in the vacuum apparatus comprises the steps of: reducing a pressure around an alloy consisting of Cu and an additive element; heating the alloy to discharge hydrogen from the alloy, at the same time, collecting the additive element into the vicinity of the surface of the alloy and precipitating it therein; and forming any one of an oxide film, a nitride film and an oxidation nitride film of the additive element on the surface of the alloy, by keeping the alloy in a temperature range between the temperature of the alloy having been heated in order to discharge hydrogen and room temperature, exposing the alloy to elemental oxygen, elemental nitrogen, a mixed gas of oxygen and nitrogen, ozone (O₃), an oxygen-containing compound, a nitrogen-containing compound, a compound containing oxygen and nitrogen, or a substance of combining them or plasma thereof, to react them with the precipitated additive element.;COPYRIGHT: (C)2006,JPO&NCIPI