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TOP CONTACT TYPE FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME TOP CONTACT TYPE FIELD EFFECT TRANSISTOR
TOP CONTACT TYPE FIELD EFFECT TRANSISTOR AND METHOD OF MANUFACTURING THE SAME TOP CONTACT TYPE FIELD EFFECT TRANSISTOR
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机译:顶部接触型场效应晶体管及制造相同顶部接触型场效应晶体管的方法
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摘要
PROBLEM TO BE SOLVED: To provide a method of forming two or more metals in a narrow pitch on an organic material layer, etc.;SOLUTION: The method of forming at least two metals 6 on at least one organic material layer 5, with the shortest distance between the metals larger than zero and not more than 100 μm, is provided. This method employs a substrate having a bridge structure 4 which consists of an upright portion extended upwards from the surface of the substrate and a crossing portion which is extended from the upright portion and crosses the substrate so as to divide a space above the substrate into two, and includes a process wherein an organic material 5 is so evaporated on the substrate as to continuously coat the surface of the substrate divided into two and the surface of the substrate below the crossing portion, and a process wherein a metal 6 is evaporated on the organic material 5 from a predetermined direction above the crossing portion after evaporating the organic material 5.;COPYRIGHT: (C)2006,JPO&NCIPI
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