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ILLUMINATOR, PROJECTION ALIGNING METHOD, PROJECTION ALIGNER, AND PROCESS FOR FABRICATING MICRODEVICE

机译:照明器,投影成象方法,投影成象器以及制造微器件的过程

摘要

PROBLEM TO BE SOLVED: To provide an illuminator in which deterioration of a reflective element group for creating a secondary light source group can be suppressed.;SOLUTION: The illuminator comprises a reflective element group (3a) having a large number of reflective elements arranged in parallel in order to form a secondary light source group based on the luminous flux from a light source, a capacitor optical system (4) for introducing light from the secondary light source group to a surface being irradiated, and a means for removing a part of light directed toward a region on the reflective surface side of the reflective element group (3a). Light being removed by the removing means is such light as being directed toward a nonreflective region occurring in the above-mentioned region depending on the relationship of arrangement of the large number of reflective elements.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种照明器,其中可以抑制用于形成次级光源组的反射元件组的劣化。解决方案:该照明器包括反射元件组(3a),该反射元件组具有布置在其中的大量反射元件。为了基于来自光源的光束而形成平行的次级光源组,用于将来自次级光源组的光引入到被照射的表面的电容器光学系统(4)以及用于去除次级光源组的一部分的装置。朝向反射元件组(3a)的反射面侧的区域的光。由去除装置去除的光是这样的光,其根据大量反射元件的布置关系被引向在上述区域中发生的非反射区域。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006253486A

    专利类型

  • 公开/公告日2006-09-21

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP20050069437

  • 发明设计人 SUZUKI KENJI;

    申请日2005-03-11

  • 分类号H01L21/027;G02B13/14;G02B13/24;G02B17/08;G03F7/20;

  • 国家 JP

  • 入库时间 2022-08-21 21:55:57

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