ILLUMINATOR, PROJECTION ALIGNER USING ILLUMINATOR, PRODUCTION OF DEVICE USING THE PROJECTION ALIGNER AND PRODUCTION OF THE PROJECTION ALIGNER

摘要

PROBLEM TO BE SOLVED: To optionally control the line width of a pattern at an optional position on an image surface by providing a 1st filter element having 1st transmissivity distribution all over the 1st area of a filter and providing a 2nd filter element having 2nd transmissivity distribution having reverse direction to the 1st one all over the 2nd area thereof. ;SOLUTION: Luminous flux from a light source 1 is condensed on the 2nd focal point of a condensing mirror 2 through a mirror 3, passes through a shutter 4 and is changed to parallel luminous flux by a collimator 5, then exposure wavelength is selected by a band pass filter 6. The luminous flux is made incident on a fly-eye lens 7 and forms a secondary light source on the emitting surface of the lens 7. The luminous flux from the secondary light source passes through a 1st condenser lens 9 after its diameter is restricted by an aperture diaphragm 8, superposably illuminates a field stop 10 and illuminates a reticle 13 where the pattern to be projected and exposed is plotted via a 2nd condenser lens group 11. A projection optical system 14 projects the pattern plotted on the reticle 13 to a wafer (photosensitive substrate) positioned on the image surface at specified magnification.;COPYRIGHT: (C)1998,JPO