首页> 外国专利> ELECTRODE SUBSTRATE, ELECTROSTATIC ACTUATOR, DROPLET DELIVERY HEAD, DROPLET DELIVERY DEVICE, ELECTROSTATIC DRIVING DEVICE, AND MANUFACTURING METHODS FOR THEM

ELECTRODE SUBSTRATE, ELECTROSTATIC ACTUATOR, DROPLET DELIVERY HEAD, DROPLET DELIVERY DEVICE, ELECTROSTATIC DRIVING DEVICE, AND MANUFACTURING METHODS FOR THEM

机译:电极基材,静电致动器,液滴输送头,液滴输送装置,静电驱动装置及其制造方法

摘要

PROBLEM TO BE SOLVED: To provide an electrode substrate arranged so as to assure a larger facing area against a driven part and individual electrode, its manufacturing method, an electrostatic actuator using the electrode substrate and a droplet delivery head.;SOLUTION: The manufacturing methods at least comprise a process of forming the mask of a chromium film 31 for forming a grooved part 8 on the substrate surface, a process of etching a glass substrate 30 and forming the grooved part 8 aligned with the opening of the mask of the chromium film 31, a process of forming a ITO33 film used as conductive material on the whole surface provided with the grooved part 8, a process of forming a resist 35 in the grooved part 8 and eliminating the ITO film formed on the part other than the grooved part 8, a process of eliminating the mask of the chromium film 31, and a process of eliminating the resist 35.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种布置成确保与被驱动部件和单个电极面对的面积更大的电极基板,其制造方法,使用该电极基板的静电致动器和液滴输送头。至少包括以下步骤:形成用于在基板表面上形成凹槽部分8的铬膜31的掩模的步骤;蚀刻玻璃基板30并且形成与铬膜的掩模的开口对准的凹槽部分8的过程。参照图31,在具有凹槽部分8的整个表面上形成用作导电材料的ITO33膜的过程,在凹槽部分8中形成抗蚀剂35并去除在除凹槽部分之外的部分上形成的ITO膜的过程。参照图8,去除铬膜31的掩模的工艺和去除抗蚀剂35的工艺。;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006256225A

    专利类型

  • 公开/公告日2006-09-28

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20050079322

  • 发明设计人 MATSUNO YASUSHI;SANO AKIRA;

    申请日2005-03-18

  • 分类号B41J2/045;B41J2/055;B41J2/16;

  • 国家 JP

  • 入库时间 2022-08-21 21:55:35

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