首页> 外国专利> LASER ABLASION DEVICE AND NANOPARTICLE PREPARING METHOD USING THE SAME

LASER ABLASION DEVICE AND NANOPARTICLE PREPARING METHOD USING THE SAME

机译:相同的激光烧蚀装置和纳米粒子的制备方法

摘要

PROBLEM TO BE SOLVED: To produce nanoparticles having fine and uniform size distribution, in one process.;SOLUTION: The laser ablasion device comprises a reaction chamber 10 provided with an electric discharge space therein; a suscepter 12 positioned in the reaction chamber, and equipped with a target 14; a laser generating portion 30 sputtering the target by a laser beam, and causing plasma electric discharge including positive charge and negative charge in the electric charge space 20; and a high voltage (HV) generating portion 40 applying positive bias voltage to a predetermined position exposed toward the electric discharge space, and drawing the negative charge from the electric discharge space to the predetermined position.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:在一个过程中产生具有精细且均匀的尺寸分布的纳米颗粒。解决方案:激光磨蚀装置包括反应室10,反应室10中设有放电空间。基座12位于反应室内,并装有靶14。激光产生部分30通过激光束溅射靶,并在电荷空间20中引起包括正电荷和负电荷的等离子体放电。高压(HV)发生部分40向正向放电空间暴露的预定位置施加正偏置电压,并从放电空间向预定位置吸引负电荷。(C)2006,JPO&NCIPI

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号