MAGNETRON SPUTTERING FILM DEPOSITION SYSTEM WITH MULTIPLEX MAGNETIC POLES, AND FILM DEPOSITION METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To perform a film deposition by forming a plasma having high ion density in a wide range on the surface of a target, and moving the plasma having high ion density effectively.;SOLUTION: In the magnetron sputtering film deposition system with multiplex magnetic poles for forming a film on a substrate, a central magnet composed of either magnetic pole is disposed at the central part on the rear face of the target, a plurality of outer circumferential magnets composed of the other magnetic pole are disposed around the circumferential direction of the rear face in the target, first external magnets and second external magnets are disposed at the outside positions in the circumferential direction of the surface in the target, a coil is wound with the direction connecting the target and the substrate as an axis, high frequency power is applied to the coil, electric power is applied to the space between the target and the substrate, and film material particles are released from the target, so as to form a film on the substrate.;COPYRIGHT: (C)2007,JPO&INPIT