SINGLE CRYSTAL MAGNESIUM OXIDE SINTERED COMPACT, METHOD FOR MANUFACTURING THE SAME, AND PROTECTIVE FILM FOR PLASMA DISPLAY PANEL

摘要

PPROBLEM TO BE SOLVED: To provide a single crystal MgO sintered compact used for a target material in order to deposit a MgO film on a substrate by using a vacuum vapor deposition method including the electron beam method in which the excellent film characteristic such as the discharge characteristic of the obtained MgO film when being used for a protective film for a PDP is improved without decreasing the density and degrading the sputtering resistance of the MgO film, and to provide a method for manufacturing the single crystal MgO sintered compact and the protective film for the PDP which is obtained from the single crystal MgO sintered compact as the target. PSOLUTION: In the single crystal magnesium oxide sintered compact, the content of Si and Ca to MgO is 0.01-3.0 mass% in terms of SiOSB2/SB, and CaO, respectively, and the inequalities 0.01 y/x 1.5, where x (pts.mass) denotes the content of Si, and y(pts.mass) denotes the content of Ca to Mg of 100 pts.mass. The protective film for a plasma display panel is manufactured by the electron beam vapor deposition method, the ion irradiation vapor deposition method, or the sputtering method by using the single crystal magnesium oxide sintered compact for a target. PCOPYRIGHT: (C)2006,JPO&NCIPI