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SAMPLE FOR EVALUATING NANOLEVEL STRUCTURAL COMPOSITION, ITS MANUFACTURING METHOD, AND EVALUATION METHOD OF NANOLEVEL STRUCTURAL COMPOSITION

机译:纳米结构组成的评估样品,其制造方法和评估方法

摘要

PROBLEM TO BE SOLVED: To provide a sample for evaluating a nanolevel structural composition, its manufacturing method, and an evaluation method of the nanolevel structural composition wherein it is possible not only to prevent the charge-up in the sample having a multilayered thin film structure in which an insulating layer is interposed but also to evaluate a surface structure precisely.;SOLUTION: A protruded sample part 2 comprises the multilayered thin film structure 3 having the insulating layer 4 interposed at least in a part thereof, and the whole surface of the surface area straddling at least the insulating layer 4 from the leading end part of the protruded sample part 2 of the sample for evaluating the nanolevel structural composition is covered with a conductive material 6 comprising a substance of which the evaporation electric field is lower than that of a conductive substance 5 for constituting a multilayered structure, to provide the sample for evaluating the nanolevel structural composition.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种用于评价纳米级结构组成的样品,其制造方法以及该纳米级结构组成的评价方法,其中不仅可以防止在具有多层薄膜结构的样品中带电。解决方案:突出的样品部件2包括多层薄膜结构3,该多层薄膜结构3至少在其一部分中插入绝缘层4,并且整个表面从用于评估纳米级结构组成的样品的突出样品部分2的前端至少跨越绝缘层4的表面覆盖有导电材料6,该导电材料6包含蒸发电场低于蒸发电场的物质。用于构成多层结构的导电物质5,以提供用于评估纳米级标准的样品结构组成;版权所有:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006052967A

    专利类型

  • 公开/公告日2006-02-23

    原文格式PDF

  • 申请/专利权人 FUJITSU LTD;

    申请/专利号JP20040233183

  • 申请日2004-08-10

  • 分类号G01N1/28;G01N1/10;

  • 国家 JP

  • 入库时间 2022-08-21 21:53:16

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