MEASURING METHOD FOR OPTICAL PROPERTY OF OPTICAL SYSTEM, OPTICAL PROPERTY MEASURING DEVICE, EXPOSURE DEVICE AND MANUFACTURING METHOD THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a measuring method for the optical property of an optical system by which optical properties are managed more closely under the condition where an optical system is used, an optical property measuring device, an exposure device in which exposure accuracy is improved, and a method for manufacturing a device in which a device of high integration degree is produced with good yield.;SOLUTION: The wavefront aberration of an reference optical system BL whose wavefront aberration is confirmed in advance is measured with an inspecting wavefront aberration measuring device 110, and a wavefront aberration measuring unit attached to the exposure to find a first difference between both the wavefront aberrations. A wavefront aberration of a projection optical system PL is measured with the inspecting wavefront aberration measuring device 110, and further, after mounting on the exposure device, measured with the wavefront aberration measuring unit to find a second difference of both the wavefront aberration. The wavefront aberration of the projection optical system PL under the condition where mounted on the exposure device is compensated based on the two difference.;COPYRIGHT: (C)2006,JPO&NCIPI