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UNEVENNESS DEFECT DETECTING METHOD AND UNEVENNESS DEFECT DETECTOR

机译:异常缺陷检测方法和异常缺陷检测器

摘要

PROBLEM TO BE SOLVED: To provide an unevenness defect detecting method capable of detecting an unevenness defects with high precision, and an unevenness defect detector.;SOLUTION: The unevenness defect detecting method has an unevenness component emphasizing processing process for applying an unevenness component emphasizing filter to each of the pixels of a photographed image to emphasizing unevenness components and an unevenness defect detecting process for detecting the uneven defect on the basis of the unevenness components emphasized value of each of the pixels obtained in the unevenness component emphasizing processing process. In the unevenness component emphasizing processing process, the luminance-comparing pixels separated from a target pixel by a predetermined distance and arranged to the periphery of the target pixel are rearranged, in the order of the magnitudes of the luminance value of the respective luminance comparing pixels to calculate the luminance average value of a predetermined number of pixels positioned at a central part and the unevenness component emphasizing filter for calculating the difference between the luminance average value and the luminance value of the target pixel to set the unevenness components emphasized value of the target pixel is used to emphasize the unevenness components. In the unevenness defect detecting process, the uneven defect is detected by comparing the unevenness components emphasized value of each of the pixels with a predetermined threshold to extract the pixel of the unevenness defect candidates.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:提供一种能够高精度地检测不均缺陷的不均缺陷检测方法和不均缺陷检测器。解决方案:该不均缺陷检测方法具有用于应用不均分量强调滤波器的不均分量强调处理过程。对于拍摄图像的每个像素,以不均匀成分为重点,并且基于不均匀成分强调处理过程中获得的每个像素的不均匀成分强调值,对不均匀缺陷进行检测的不均匀缺陷检测处理。在不均匀成分强调处理过程中,以与各个亮度比较像素的亮度值的大小的顺序,重新排列与目标像素隔开预定距离并排列在该目标像素的周围的多个亮度比较像素。计算位于中央部分的预定数目的像素的亮度平均值和不均匀度强调滤波器,该不均匀度强调滤波器用于计算目标像素的亮度平均值和亮度值之间的差,以设置目标的不均匀度强调值像素用于强调不均匀分量。在不均匀缺陷检测过程中,通过将每个像素的不均匀成分强调值与预定阈值进行比较来检测不均匀缺陷,以提取不均匀缺陷候选像素。COPYRIGHT:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006145228A

    专利类型

  • 公开/公告日2006-06-08

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20040331833

  • 申请日2004-11-16

  • 分类号G01N21/88;G01M11/00;G02F1/13;G06T1/00;G06T5/00;G06T5/20;

  • 国家 JP

  • 入库时间 2022-08-21 21:52:16

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