首页> 外国专利> UNEVENNESS DEFECT DETECTION METHOD AND DEVICE, SPATIAL FILTER, UNEVENNESS DEFECT INSPECTION SYSTEM, AND PROGRAM FOR UNEVENNESS DEFECT DETECTION METHOD

UNEVENNESS DEFECT DETECTION METHOD AND DEVICE, SPATIAL FILTER, UNEVENNESS DEFECT INSPECTION SYSTEM, AND PROGRAM FOR UNEVENNESS DEFECT DETECTION METHOD

机译:不均匀缺陷检测方法和装置,空间滤波器,不均匀缺陷检查系统以及不均匀缺陷检测方法的程序

摘要

PROBLEM TO BE SOLVED: To obtain an unevenness defect detection method for enhancing unevenness constituents only and detecting unevenness more reliably, to provide a device for detecting unevenness defects automatically, and to provide an inspection system, or the like.;SOLUTION: An unevenness detection processing means 7C repeats processes for obtaining the difference in luminance between a pixel that becomes an arbitrary reference and two pixels that are symmetrical with respect to a point with prescribed distance with the reference pixel as a center from image data based on an image to be detected, determining one of the differences in luminance with two pixels or a prescribed value as a tentative value in the two pixels, based on the correlation relationship with the luminance value of two pixels that are symmetrical with respect to a point, successively changing two pixels that are symmetrical with respect to a point with the reference pixel, and determining the tentative value by obtaining the difference in luminance between two pixels, and hence determining the value of an unevenness constituent emphasis result in a pixel that becomes a reference, based on a determined tentative value in the two pixels.;COPYRIGHT: (C)2006,JPO&NCIPI
机译:解决的问题:获得一种不均匀缺陷检测方法,该方法仅用于增强不均匀成分并更可靠地检测不均匀,提供一种用于自动检测不均匀缺陷的装置,并提供检查系统等;解决方案:不均匀检测处理装置7C重复进行这样的处理:基于要检测的图像,从图像数据获得用于成为任意基准的像素和相对于以基准像素为中心的以规定距离为中心的点对称的两个像素之间的亮度差。 ,基于与相对于一个点对称的两个像素的亮度值的相关关系,确定两个像素的亮度差之一或作为两个像素中的暂定值的预定值,依次改变两个像素,相对于参考像素点对称,并通过获得两个像素之间的亮度差,从而基于两个像素中确定的暂定值确定不均匀成分加重的值,从而使该像素成为参考。;版权:(C)2006,JPO&NCIPI

著录项

  • 公开/公告号JP2006133055A

    专利类型

  • 公开/公告日2006-05-25

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20040321816

  • 申请日2004-11-05

  • 分类号G01N21/88;G01B11/30;G01M11/00;G02F1/13;

  • 国家 JP

  • 入库时间 2022-08-21 21:54:38

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